A comparative study on the effect of VUV radiation in plasma SiOx-coated polyimide and polypropylene films

Progress in Organic Coatings

Volumn 61, Issue 2-4, 2008, Pages 326-332

  Ziari, Z ^a   Bellel, A ^a   Sahli, S ^a   Segui, Y ^b   Raynaud, P ^b  

^a Universite Mentouri Constantine   (Algeria)

^b UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

Plasma; Polyimide; Polypropylene; SiOx thin layers; Wettability

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON CYCLOTRON RESONANCE; POLYIMIDES; POLYPROPYLENES; SILICON COMPOUNDS; WETTING;

EVOLUTION BEHAVIOR; HEXAMETHYLDISILOXANE; PLASMA DEPOSITIONS; VUV IRRADIATION;

POLYMER FILMS;

EID: 38949120185     PISSN: 03009440     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.porgcoat.2007.09.025     Document Type: Article

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