Characterization of the radical oxidative level in the degradation of phenolic compounds with H2O2/UV

Journal of Advanced Oxidation Technologies

Volumn 11, Issue 1, 2008, Pages 21-32

  De Luis, A ^a   Lombrana J I ^a,b   Menendez A ^a  

^a UNIVERSITY OF THE BASQUE COUNTRY UPV EHU   (Spain)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN PEROXIDE; IRRADIATION; MERCURY VAPOR LAMPS; OXIDATION; PEROXIDES;

ADVANCED OXIDATION PROCESS; INITIAL CONDITIONS; KINETIC MODELING; PHENOLIC COMPOUNDS; RADICAL OXIDATION; RADICAL SPECIES; REACTION SYSTEM; UV IRRADIATION;

PHENOLS;

EID: 38849162924     PISSN: 12038407     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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