Uv/h2o2 chemical oxidation for high loaded effluents: A degradation kinetic study of las surfactant wastewaters

Environmental Technology (United Kingdom)

Volumn 24, Issue 7, 2003, Pages 903-911

  Sanz, J ^a   Lombrana J I ^a   De Luis, A Ma ^a   Varona, F ^a  

^a UNIVERSITY OF THE BASQUE COUNTRY UPV EHU   (Spain)

Author keywords

Advanced oxidation processes (aop); H2O2 UV; Hydroxyl radicals; Pollutants in high load. linear alkylbenzene sulphonates (las)

Indexed keywords

DEGRADATION; EFFLUENTS; KINETIC THEORY; PHOTOLYSIS; RATE CONSTANTS; SOAPS (DETERGENTS); WASTEWATER TREATMENT;

ADVANCED OXIDATION PROCESS; H2O2/UV; HIGH LOAD; HYDROXYL RADICALS; LINEAR ALKYLBENZENE SULPHONATES;

OXIDATION;

ALKYLBENZENESULFONIC ACID; DETERGENT; HYDROGEN PEROXIDE; HYDROXYL RADICAL; SURFACTANT;

HYDROGEN PEROXIDE; KINETICS; OXIDATION; SURFACTANT; ULTRAVIOLET RADIATION; WASTEWATER TREATMENT;

ARTICLE; CHEMICAL MODEL; CONCENTRATION (PARAMETERS); CONTROLLED STUDY; EFFLUENT; INDUSTRIAL WASTE; KINETICS; LABORATORY TEST; OXIDATION; PHOTODEGRADATION; PHOTOLYSIS; QUANTITATIVE ANALYSIS; QUANTUM YIELD; ULTRAVIOLET RADIATION; URBAN AREA; WASTE WATER; WASTE WATER MANAGEMENT;

EID: 0043245798     PISSN: 09593330     EISSN: 1479487X     Source Type: Journal    
DOI: 10.1080/09593330309385627     Document Type: Article

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