Photocatalytic decomposition of CCl4 on Zr-MCM-41

Journal of Hazardous Materials

Volumn 151, Issue 2-3, 2008, Pages 461-464

  Chien, Y C ^a   Wang, H Paul ^b   Liu, S H ^c   Hsiung, T L ^b   Tai, H S ^d   Peng, C Y ^b  

^a FOOYIN UNIVERSITY   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^c INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

^d NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

Author keywords

CCl4; Photocatalysis; Zr MCM 41; ZrO2

Indexed keywords

DECOMPOSITION; DEGRADATION; HYDROGEN; PHOTOCATALYSIS; ZIRCONIUM COMPOUNDS;

AMORPHOUS WALL; PHOTOCATALYTIC DECOMPOSITION; ZR-MCM-41;

CARBON INORGANIC COMPOUNDS;

CARBON TETRACHLORIDE; MCM 41; ZIRCONIUM; HYDROGEN; MCM-41; SILICON DIOXIDE; WATER;

CARBON INORGANIC COMPOUNDS; DECOMPOSITION; DEGRADATION; HYDROGEN; PHOTOCATALYSIS; ZIRCONIUM COMPOUNDS;

CATALYSIS; CHLORIDE; DECOMPOSITION; HYDROGEN; ZIRCONIUM;

ARTICLE; DECOMPOSITION; ELECTRON TRANSPORT; PHOTOCATALYSIS; POWDER DIFFRACTION; ULTRAVIOLET RADIATION; X RAY DIFFRACTION; CATALYSIS; CHEMISTRY; EQUIPMENT DESIGN; METHODOLOGY; PHOTOCHEMISTRY; PHOTOLYSIS; TIME; ULTRAVIOLET SPECTROPHOTOMETRY;

CARBON TETRACHLORIDE; CATALYSIS; CHEMISTRY, ANALYTICAL; EQUIPMENT DESIGN; HYDROGEN; PHOTOCHEMISTRY; PHOTOLYSIS; SILICON DIOXIDE; SPECTROPHOTOMETRY, ULTRAVIOLET; TIME FACTORS; WATER; X-RAY DIFFRACTION; ZIRCONIUM;

EID: 38749152894     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2007.06.027     Document Type: Article

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