Germanium nanoparticles formation in silicon dioxide layer by multi-energy implantation of Ge negative ions and their photo-luminescence

Materials Science and Engineering: B

Volumn 147, Issue 2-3, 2008, Pages 230-234

  Arai, Nobutoshi ^a,b   Tsuji, Hiroshi ^a   Nakatsuka, Hiroyuki ^a   Kojima, Kenji ^a   Adachi, Kouichirou ^b   Kotaki, Hiroshi ^b   Ishibashi, Toyotsugu ^a   Gotoh, Yasuhito ^a   Ishikawa, Junzo ^a  

^a KYOTO UNIVERSITY   (Japan)

^b SHARP CORPORATION   (Japan)

Author keywords

Germanium; Heat treatment; Ion implantation; Photo luminescence

Indexed keywords

GERMANIUM; HEAT TREATMENT; ION IMPLANTATION; PHOTOLUMINESCENCE; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

ANNEALING TEMPERATURE INTENSITY; EXCITATION LIGHT; PHOTOLUMINESCENCE MEASUREMENT;

NANOPARTICLES;

EID: 38749152440     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.08.023     Document Type: Article

References (9)

1. Rebohle L., von Borany J., Yankov R.A., Skorupa W., Tyschenko I.E., Froeb H., and Leo K. Appl. Phys. Lett. 71 19 (1997) 2809-2811
2. Lopes J.M.J., Zawislak F.C., Behar M., Fichtner P.F.P., Rebohle L., and Skarupa W. J. Appl. Phys. 94 9 (2003) 6059-6064
3. Ishikawa J., Tsuji H., Toyota Y., Gotoh Y., Matsuda K., Tanho M., and Sakai S. Nucl. Instrum. Methods B96 (1995) 7-12
4. Tsuji H., Kido S., Sasaki H., Gotoh Y., and Ishikawa J. Rev. Sci. Instrum. 71 (2000) 804
5. Tsuji H., Ishikawa J., Gotoh Y., and Okada Y. AIP Conf. Proc. 287 (1994) 530
6. Biersack J.P. Nucl. Instrum. Methods B 27 (1987) 21
7. Skuja L. J. Non-Cryst. Solids 239 (1998) 16-48
8. Rebohle L., von Borany J., Froeh H., and Skorupa W. J. Appl. Phys. B71 (2000) 131-151
9. Fitting H.-J., Barfels T., Trukhin A.N., Schmidt B., Gulans A., and von Czarnowski A. J. Non-Cryst. Solids 303 (2002) 218-231