Effect of wafer rotation on photoresist stripping in supercritical CO 2

Solid State Phenomena

Volumn 134, Issue , 2008, Pages 355-358

  Saga, Koichiro ^a   Kuniyasu, Hitoshi ^a   Hattori, Takeshi ^a   Saito, K ^b   Mizobata, I ^b   Iwata, T ^b   Hirae, S ^b  

^a SONY CORPORATION   (Japan)

^b DAINIPPON SCREEN MFG CO LTD   (Japan)

Author keywords

Low k film; Photoresist stripping; Wafer rotation

Indexed keywords

EID: 38549158066     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (3)

1. th Meeting of The Electrochemical Society, Vol.MA2003, Orlando.
2. K. Saga, H. Kuniyasu, T. Hattori, K. Yamada and T. Azuma, in Proceedings of Ultra Clean Processing of Silicon Surfaces, pp. 115-120, Scitec Publications, Switzerland, 2005.
3. th Meeting of The Electrochemical Society, Vol.MA2005, Los Angeles.