Etching of silicon oxide films in supercritical carbon dioxide

Solid State Phenomena

Volumn 103-104, Issue , 2005, Pages 115-120

  Saga, Koichiro ^a   Kuniyasu, Hitoshi ^a   Hattori, Takeshi ^a   Yamada, Kenji ^b   Azuma, Tomoyuki ^b  

^a SONY CORPORATION   (Japan)

^b MITSUBISHI GAS CHEMICAL COMPANY INC   (Japan)

Author keywords

Etching; MEMS; Silicon dioxide; Supercritical CO2

Indexed keywords

EID: 36048970398     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.103-104.115     Document Type: Conference Paper

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