Effect of oxygen partial pressure on the ferromagnetism of Cr-doped TiO2 films

Journal of Physics D: Applied Physics

Volumn 41, Issue 1, 2008, Pages

  Zhang, Xiao ^a   Wang, Weihua ^a   Li, Luyan ^a   Cheng, Yahui ^a   Luo, Xiaoguang ^a   Liu, Hui ^a  

^a NANKAI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; DOPING (ADDITIVES); FERROMAGNETISM; PARTIAL PRESSURE SENSORS; POLYCRYSTALLINE MATERIALS; SPUTTERING; TITANIUM OXIDES;

COSPUTTERING; FERROMAGNETIC ORIGINS; OXYGEN PARTIAL PRESSURE;

MAGNETIC FILMS;

EID: 38549155737     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/1/015005     Document Type: Article

References (29)

1. Matsumoto Y, Murakami M, Shono T, Hasegawa T, Fukumura T, Kawasaki M, Ahmet P, Chikyow T, Koshihara S and Koinuma H 2001 Science 291 854-6
2. Wolf S A, Awschalom D D, Buhrman R A, Daughton J M, von Molnr S, Roukes M L, Chtchelkanova A Y and Treger D M 2001 Science 294 1488-95
3. Kaspar T C et al 2006 Phys. Rev. B 73 155327
4. Wang Y X, Liu Hui, Li Z Q, Zhang X X, Zheng R K and Ringer S P 2006 Appl. Phys. Lett. 89 042511
5. Sharma P, Gupta A, Rao K V, Owens F J, Sharma R, Ahuja R, Guillen J M O, Johansson B and Gehring G A 2003 Nature Mater. 2 673-7
6. Liu Hui, Zhang Xiao, Li Luyan, Wang Y X, Gao K H, Li Z Q, Zheng R K, Ringer S P, Zhang Bei and Zhang X X 2007 Appl. Phys. Lett. 91 072511
7. Coey J M D, Douvalis A P, Fitzgerald C B and Venkatesan M 2004 Appl. Phys. Lett. 84 1332-4
8. Ogale S B et al 2003 Phys. Rev. Lett. 91 077205
9. Kim J Y et al 2003 Phys. Rev. Lett. 90 017401
10. Kim Y J, Thevuthasan S, Droubay T, Lea A S, Wang C M, Shutthanandan V, Chambers S A, Sears R P, Taylor B and Sinkovic B 2004 Appl. Phys. Lett. 84 3531-3
11. Janisch R, Gopal P and Spaldin N A 2005 J. Phys.: Condens. Matter 17 R657-89
12. Dietl T, Ohno H, Matsukura F, Cibert J and Ferrand D 2000 Science 287 1019-22
13. Coey J M D, Venkatesan M and Fitzgerald C B 2005 Nature Mater. 4 173-9
14. Griffin K A, Pakhomov A B, Wang C M, Heald S M and Krishnan K M 2005 Phys. Rev. Lett. 94 157204
15. Kaspar T C et al 2005 Phys. Rev. Lett. 95 217203
16. Hong N H, Sakai J and Brizé V 2007 J. Phys.: Condens. Matter 19 036219
17. Arcas J, Hernando A, Barandiarn J M, Prados C, Vzquez M, Marín P and Neuweiler A 1998 Phys. Rev. B 58 5193-6
18. Stoner E C and Wohlfarth E P 1991 IEEE Trans. Magn. 27 3475-518
19. Mager A 1952 Ann. Phys. (Lpz.) 6F.11 15
20. Löffler J F, Meier J P, Doudin B, Ansermet J P and Wagner W 1998 Phys. Rev. B 57 2915-24
21. John E J, Droubay T C and Chambers S A 2005 J. Appl. Phys. 97 073908
22. Chen J, Rulis P, Ouyang L Z, Satpathy S and Ching W Y 2006 Phys. Rev. B 74 235207
23. Errico L A, Rentería M and Weissmann M 2005 Phys. Rev. B 72 184425
24. Duhalde S, Vignolo M F, Golmar F, Chiliotte C, Torres C E R, Errico L A, Cabrera A F, Rentería M, Snchez F H and Weissmann M 2005 Phys. Rev. B 72 161313
25. Hou D L, Meng H J, Jia L Y, Ye X J, Zhou H J and Li X L 2007 Phys. Lett. A 364 318-22
26. Suryanarayanan R, Naik V M, Kharel P, Talagala P and Naik R 2005 J. Phys.: Condens. Matter 17 755-62
27. Mott N F and Davis E A 1971 Electron Processes in Non-Crystalline Materials (Clarendon: Oxford) p 389
28. Asanuma T, Matsutani T, Liu C, Mihara T and Kiuchi M 2004 J. Appl. Phys. 95 6011-6
29. DeLoach J D, Scarel G and Aita C R 1999 J. Appl. Phys. 85 2377-84