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Journal of Optoelectronics and Advanced Materials

Volumn 9, Issue 7, 2007, Pages 2291-2295

Chemical binding and structure of carbonic thin films with advanced properties studied by electron spectroscopy

(7) Andrei, V a Andref, E b Vlaicu, G H c Stihf, C c Dima, G c Oros, C c Dinu, S c

a Institute for Nuclear Reactors (Romania)

b NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES (Romania)

c VALAHIA UNIVERSITY OF TARGOVISTE (Romania)

Author keywords

Electron spectroscopy for chemical analysis; Hard c films; Plasma techniques

Indexed keywords

CARBON FILMS; CARBON NITRIDE; CHEMICAL ANALYSIS; ELECTRON SPECTROSCOPY; FRICTION; PLASMA JETS; SPECTRUM ANALYSIS;

C FILMS; CAPACITIVELY COUPLED; CARBON NITRIDE THIN FILMS; CHEMICAL BINDING; CHEMICAL INERTNESS; ELECTRON SPECTROSCOPY FOR CHEMICAL ANALYSIS; LOW FRICTION COEFFICIENTS; PLASMA TECHNIQUES;

THIN FILMS;

EID: 38549150425 PISSN: 14544164 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.