Effect of sputtered Cu film's diffusion barrier on the growth and field emission properties of carbon nanotubes by chemical vapor deposition

Applied Physics A: Materials Science and Processing

Volumn 90, Issue 4, 2008, Pages 701-704

  Wang, Lili ^a   Chen, Ting ^a   Feng, Tao ^a   Chen, Yiwei ^a   Que, Wenxiu ^a   Lin, Lifeng ^a   Sun, Zhuo ^a  

^a EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER; DIFFUSION BARRIERS; FIELD EMISSION DISPLAYS; MAGNETRON SPUTTERING; THIN FILMS;

DC MAGNETRON SPUTTERING; VOLTAGE CURRENT;

CARBON NANOTUBES;

EID: 38549137434     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-007-4333-x     Document Type: Article

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