SCOPUS 정보 검색 플랫폼

Volumn 32, Issue 19, 2007, Pages 2843-2845

Enhancement of the evanescent field using polymer waveguides fabricated by deep UV exposure on mesoporous silicon

Author keywords

[No Author keywords available]

Indexed keywords

EVANESCENT FIELDS; LAYER SEQUENCE; REVERSE SYMMETRY WAVEGUIDES;

GEOMETRY; MESOPOROUS MATERIALS; POLYMERS; SILICON; ULTRAVIOLET RADIATION;

OPTICAL WAVEGUIDES;

POLYMER; SILICON;

ARTICLE; CHEMISTRY; EQUIPMENT DESIGN; FIBER OPTICS; INSTRUMENTATION; LIGHT; OPTICS; RADIATION EXPOSURE; RADIATION SCATTERING; ULTRAVIOLET RADIATION;

EQUIPMENT DESIGN; FIBER OPTICS; LIGHT; OPTICS; POLYMERS; SCATTERING, RADIATION; SILICON; ULTRAVIOLET RAYS;

EID: 38449121592 PISSN: 01469592 EISSN: 15394794 Source Type: Journal
DOI: 10.1364/OL.32.002843 Document Type: Article

Times cited : (9)

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