Contamination monitoring and control on ASML MS-VII 157nm exposure tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 3, 2004, Pages 1695-1707

  Okoroanyanwu, Uzodinma ^a,b   Gronheid, Roel ^b   Coenen, Jan ^b   Hermans, Jan ^b   Ronse, Kurt ^b  

^a ADVANCED MICRO DEVICES   (United States)

^b IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; GAS CHROMATOGRAPHY; LENSES; LIGHT TRANSMISSION; MASS SPECTROMETRY; PHOTOIONIZATION; VOLATILE ORGANIC COMPOUNDS;

CONTAMINATION MONITORING; EXPOSURE TOOLS; PROJECTION OPTICS; RELAY STATIONS;

LITHOGRAPHY;

EID: 3843106807     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536440     Document Type: Conference Paper

References (5)

1. K. Ronse et al. "Optical path monitoring of a full-field 157nm scanner," Proc. SPIE vol 5377, Optical Microlithography XVII (2004), this proceedings.
2. P.N Caugh, B.A. Thrust, Transaction of Faraday Society, 63, 915 (1967).
3. O. Kishkovich and M. Joffe. "Real-Time Low-Level Pollution Monitoring for IAQ Applications". Proceedings of an International Specialty Conference on "Measurements of Toxic and Related Air Pollutants" Air and Waste Management Association, Research Triangle Park, NC. (May 7-9, 1996).
4. U. Okoroanyanwu et al. "Experimental investigation of fabrication process-, transportation-, storage-, and handlinginduced contamination of 157nm reticles and VUV cleaning, Proc. SPIE vol 5377, Optical Microlithography XVII (2004), this proceedings.
5. T.M. Bloomstein, D.E. Hardy, L. Gomez, M. Rotschild, "Angular- resolved scattering measurements of polished surfaces and optical coatings at 157", Proc. SPIE vol. 5040, Optical Microlithography, 742-752 (2003)