Dual-chamber ultra line-narrowed excimer light source for 193 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 III, Issue , 2003, Pages 1694-1703

  Fleurov, V B ^a   Colon III, D J ^a   Brown, D J W ^a   O'Keeffe, P ^a   Besaucele, H ^a   Ershov, A I ^a   Trinchouk, F ^a   Ishihara, T ^a   Zambon, P ^a   Rafac, R ^a   Lukashev, A ^a  

^a CYMER INC   (United States)

Author keywords

193nm light source; DUV; Excimer laser; Microlithography; MOPA; Narrow bandwidth

Indexed keywords

EFFICIENCY; EXCIMER LASERS; LIGHT SOURCES; OSCILLATORS (ELECTRONIC); ROBUSTNESS (CONTROL SYSTEMS);

MASTER OSCILLATOR POWER AMPLIFIER; NARROW BANDWIDTH;

PHOTOLITHOGRAPHY;

EID: 0141498161     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485358     Document Type: Conference Paper

References (8)

1. G. Rylov, "F2 MOPA: Some Aspects of Spectral Purity," 3rd International Symposium on 157nm Lithography, 3-6 September 2002, Antwerp, Belgium.
2. Daniel J. W. Brown, Vladimir Fleurov, Alex Ershov, Fedor Trintchouk "New DUV Light Source Breaks Lithography Barriers", 2003, Semicon, Japan
3. V. Fleurov, T. Duffey, G.M. Blumenstock, P. Newman, X.J. Pan, T. Watson, "The New Generation of High Repetition Rate Lasers for sub-100nm Lithography," Paper IB01-04 in Digest of Technical Papers, SEMICON Taiwan 2001.
4. J. Martin Algots, Richard Sandstrom, William Partlo, Petar Maroevic, Eric Eva, Michael Gerhard, Ralf Lindner, Frank Stietz "Compaction and Rarefaction of Fused Silica with 193-nm Excimer Laser Exposure", Optical Microlithography XVI, 2003, 23-28 February 2003, Santa Clara, CA, USA
5. R. Sandsrom, A. Ershov, V. Fleurov, "MOPA Laser Architecture for High Power Lithographic Light Sources" SPIE 27'th Conference on Microlithography, March 3-8, 2002, Santa Clara, AC, USA
6. P.C. Oh, V. Fleurov, T. Hofmann, T. Duffey, F. Trintchouk, P. O'Keeffe, P. Newman, G.M. Blumenstock, "Production ready 4kHz ArF Laser for 193nm Lithography, Optical Microlithography XV, 2002, SPIE, Volume 4691, p. 1753-1760
7. R. Sandstrom, Proc. of 2nd Symposium on 193nm Lithography, Colorodo Springs, CO, 1997
8. R. Sandstrom, "Dependence of Compaction in Fused Silica on Laser Pulsewidth at 193 nm", paper E-017,Fourth Intl. Symposium on 193 nm Lithography, Telfs, Austria (Sept., 1998)