Emission characteristics and control efficiency of acidic and basic gases and aerosols from packed towers

Atmospheric Environment

Volumn 38, Issue 4, 2004, Pages 643-646

  Tsai, Chuen Jinn ^a   Chang, Chang Tso ^a   Liu, Tsing Wei ^a   Huang, Chun Chao ^a   Chien, Chih Liang ^a   Chein, Hung Min ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Acidic aerosols; Air pollution control; Emission factor; Semiconductor manufacturing

Indexed keywords

AEROSOLS; ETCHING; SEMICONDUCTOR MATERIALS;

EMISSION RATES;

ENVIRONMENTAL ENGINEERING;

ACID; BASE; CHLORINE DERIVATIVE; FLUORINE DERIVATIVE; NITROGEN DERIVATIVE; SULFUR DERIVATIVE;

AEROSOL; ATMOSPHERIC POLLUTION; INDUSTRIAL EMISSION; POLLUTION CONTROL;

AEROSOL; AIR MONITORING; AIR POLLUTANT; AIR POLLUTION; AIR POLLUTION CONTROL; ARTICLE; GAS; INDUSTRY; PRIORITY JOURNAL; TAIWAN;

ASIA; EURASIA; FAR EAST; TAIWAN;

EID: 0346816625     PISSN: 13522310     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.atmosenv.2003.10.002     Document Type: Article

References (8)

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3. Taiwan EPA, 1999. Air Pollution Regulation and Emission Standard for Semiconductor Manufacturing Industry. Taiwan EPA, Taipei, Taiwan.
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