Measuring thermal expansion variations in ULE®Glass with interferometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 847-853

  Harper, Brian L ^a   Hrdina, Kenneth E ^a   Navan, W David ^a   Ellison, Joseph ^a   Fanning, Andrew ^b  

^a Semiconductor Optics Division ^*  (United States)

^b Fanning Technical Services   (United States)

Author keywords

CTE; EUVL; Homogeneity; LTEM; Metrology interferometer; Optics; Photomasks; Striae; Thermal expansion; ULE

Indexed keywords

COEFFICIENT OF THERMAL EXPANSION (CTE); EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); METROLOGY INTERFEROMETER; PHASE MEASURING INTERFEROMETRY (PMI);

CAMERAS; ELECTROMAGNETIC WAVE REFRACTION; ERROR CORRECTION; INTERFEROMETRY; LASER OPTICS; PHASE MEASUREMENT; PRISMS; REFRACTIVE INDEX; THERMAL EXPANSION;

PHOTOLITHOGRAPHY;

EID: 3843054576     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535133     Document Type: Conference Paper

References (3)

1. 2 System," from Amorphous Materials, ed. By Douglas and Ellis, Wiley, NY, 453-461, 1970.
2. th, 2003.
3. nd, 2003.