Pulsed closed field unbalanced magnetron sputtering (P-CFUBMS) deposited TiC/a:C thin films

Materials Science Forum

Volumn 561-565, Issue PART 2, 2007, Pages 1177-1180

  Lin, Jianliang ^a   Mishra, Brajendra ^a   Pinkas, Malki ^b   Moore, J John ^a  

^a Department of Metallurgical and Materials Engineering   (United States)

^b NUCLEAR RESEARCH CENTER NEGEV   (Israel)

Author keywords

Magnetron sputtering; Nanocomposite film; Substrate bias; TiC a:C; Wear resistance

Indexed keywords

CONCENTRATION (PROCESS); HARDNESS; MAGNETRON SPUTTERING; TITANIUM CARBIDE; WEAR RESISTANCE;

CARBON CONCENTRATION; NANOCOMPOSITE FILM; SUBSTRATE BIAS;

THIN FILMS;

EID: 38349139536     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-462-6.1177     Document Type: Conference Paper

References (6)

1. D. Galvan, Y.T. Pei and J. Th. M. De. Hosson: Surf. Coat. Technol. Vol. 200 (2006), p.6718.
2. A.A. Voevodin and J.S. Zabinski: Journal of Materials Science. Vol. 33 (1998), p. 319.
3. J. Lin, J.J. Moore, B. Mishra, M. Pinks, W.D. Sproul and J.A. Rees: Surf. Coat. Technol. (2007) in press.
4. M. Audronis, A. Leyland, P.J. Kelly, A. Matthews: Surf. Coat. Technol. Vol. 201 (2006) 3970.
5. J. Lin, B. Mishra, J.J. Moore, W.D. Sproul and J.A. Rees: Surf. Coat. Technol. Vol 201 (2007), p. 6960
6. A. Leyland, A Matthews: Wear. Vol. 246 (2000), p.1