-
1
-
-
0000607560
-
-
JAPIAU 0021-8979 10.1063/1.350710.
-
X. C. Zhang and D. H. Auston, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.350710, 71, 326 (1992).
-
(1992)
J. Appl. Phys.
, vol.71
, pp. 326
-
-
Zhang, X.C.1
Auston, D.H.2
-
2
-
-
21544452970
-
-
APPLAB 0003-6951 10.1063/1.102601.
-
X. C. Zhang, B. B. Hu, J. T. Darrow, and D. H. Auston, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.102601, 56, 1011 (1990).
-
(1990)
Appl. Phys. Lett.
, vol.56
, pp. 1011
-
-
Zhang, X.C.1
Hu, B.B.2
Darrow, J.T.3
Auston, D.H.4
-
3
-
-
0036571880
-
-
JAPIAU 0021-8979 10.1063/1.1465507.
-
P. Gu, M. Tani, S. Kono, and K. Sakai, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1465507, 91, 5533 (2002).
-
(2002)
J. Appl. Phys.
, vol.91
, pp. 5533
-
-
Gu, P.1
Tani, M.2
Kono, S.3
Sakai, K.4
-
4
-
-
11944268790
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.68.102.
-
S. L. Chuang, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.68. 102, 68, 102 (1992).
-
(1992)
Phys. Rev. Lett.
, vol.68
, pp. 102
-
-
Chuang, S.L.1
-
5
-
-
0000439535
-
-
APPLAB 0003-6951 10.1063/1.1334940.
-
C. Weiss, R. Wallenstein, and R. Beigang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1334940, 77, 4160 (2000).
-
(2000)
Appl. Phys. Lett.
, vol.77
, pp. 4160
-
-
Weiss, C.1
Wallenstein, R.2
Beigang, R.3
-
6
-
-
20444472396
-
-
APPLAB 0003-6951 10.1063/1.1835550.
-
Alexander M. Sinyukov, Megan R. Leahy, and L. Michael Hayden, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1835550, 85, 5827 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 5827
-
-
Sinyukov, A.M.1
Leahy, M.R.2
Hayden, L.M.3
-
7
-
-
79956049695
-
-
APPLAB 0003-6951 10.1063/1.1497192.
-
J. Darmo, G. Strasser, T. Muller, R. Bratshitsch, and K. Unterrainer, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1497192, 81, 871 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 871
-
-
Darmo, J.1
Strasser, G.2
Muller, T.3
Bratshitsch, R.4
Unterrainer, K.5
-
8
-
-
38349098412
-
-
OPEXFF 1094-4087 10.1364/OE.15.005120.
-
J. S. Hwang, H. C. Lin, C. K. Chang, T. S. Wang, L. S. Chang, J. I. Chyi, W. S. Lin, S. H. Chen, H. H. Lin, and P. W. Liu, Opt. Express OPEXFF 1094-4087 10.1364/OE.15.005120, 15, 5120 (2007).
-
(2007)
Opt. Express
, vol.15
, pp. 5120
-
-
Hwang, J.S.1
Lin, H.C.2
Chang, C.K.3
Wang, T.S.4
Chang, L.S.5
Chyi, J.I.6
Lin, W.S.7
Chen, S.H.8
Lin, H.H.9
Liu, P.W.10
-
9
-
-
0001403028
-
-
APPLAB 0003-6951 10.1063/1.125050.
-
J. S. Hwang, W. C. Hwang, Z. P. Yang, and G. S. Chang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.125050, 75, 2467 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 2467
-
-
Hwang, J.S.1
Hwang, W.C.2
Yang, Z.P.3
Chang, G.S.4
-
10
-
-
21044446420
-
-
APPLAB 0003-6951 10.1063/1.1855406.
-
J. S. Hwang, K. I. Lin, H. C. Lin, S. H. Hsu, K. C. Chen, and Y. T. Lu, Y. G. Hong, and C. W. Tu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1855406, 86, 061103 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 061103
-
-
Hwang, J.S.1
Lin, K.I.2
Lin, H.C.3
Hsu, S.H.4
Chen, K.C.5
Lu, Y.T.6
Hong, Y.G.7
Tu, C.W.8
-
11
-
-
0041339900
-
-
JAPIAU 0021-8979 10.1063/1.1578528.
-
J. S. Hwang, C. C. Chang, M. F. Chen, C. C. Chen, K. I. Lin, and F. C. Tang, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1578528, 94, 348 (2003).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 348
-
-
Hwang, J.S.1
Chang, C.C.2
Chen, M.F.3
Chen, C.C.4
Lin, K.I.5
Tang, F.C.6
-
12
-
-
0000530672
-
-
JAPIAU 0021-8979 10.1063/1.370961.
-
G. S. Chang, W. C. Hwang, Y. C. Wang, Z. P. Yang, and J. S. Hwang, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.370961, 86, 1765 (1999).
-
(1999)
J. Appl. Phys.
, vol.86
, pp. 1765
-
-
Chang, G.S.1
Hwang, W.C.2
Wang, Y.C.3
Yang, Z.P.4
Hwang, J.S.5
-
13
-
-
0001427571
-
-
APPLAB 0003-6951 10.1063/1.123572.
-
H. Shen, W. Zhou, J. Pamulapati, and F. Ren, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.123572, 74, 1430 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.74
, pp. 1430
-
-
Shen, H.1
Zhou, W.2
Pamulapati, J.3
Ren, F.4
-
14
-
-
38349095454
-
-
Metal-Semiconductor Contacts, Oxford, New York.
-
E. H. Rhoderick, Metal-Semiconductor Contacts, Oxford, New York (1980).
-
(1980)
-
-
Rhoderick, E.H.1
|