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Volumn 354, Issue 14, 2008, Pages 1509-1515

Point defect formation and annihilation in silica glass by heat-treatment: Role of water and stress

Author keywords

Defects; Electron spin resonance; Optical spectroscopy; Silica; Water in glass

Indexed keywords

EMISSION SPECTROSCOPY; HEAT TREATMENT; PARAMAGNETIC RESONANCE; POINT DEFECTS; STRESS ANALYSIS; WATER VAPOR;

EID: 38349097891     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.08.039     Document Type: Article
Times cited : (11)

References (32)
  • 9
    • 0001467223 scopus 로고
    • 622, 670
    • Scholze H. Glass Ind. 47 (1966) 546 622, 670
    • (1966) Glass Ind. , vol.47 , pp. 546
    • Scholze, H.1
  • 23
    • 38349109765 scopus 로고    scopus 로고
    • A. Agarwal, PhD thesis, Rensselaer Polytechnic Institute, Troy, NY, 1995.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.