Tracer diffusion of boron in α-Ti and γ-TiAl

Intermetallics

Volumn 16, Issue 2, 2008, Pages 148-155

  Divinski, S V ^a   Hisker, F ^a   Wilger, T ^a   Friesel, M ^b   Herzig, Chr ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

^b CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

A. Titanium aluminides, based on TiAl; B. Diffusion; D. Defects: point defects

Indexed keywords

ENTHALPY; INTERMETALLICS; POINT DEFECTS; POLYCRYSTALLINE MATERIALS; SECONDARY ION MASS SPECTROMETRY; TITANIUM COMPOUNDS;

ARRHENIUS TEMPERATURE DEPENDENCIES; TITANIUM ALUMINIDES; TRACER DIFFUSION;

BORON;

EID: 38149113506     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.intermet.2007.08.008     Document Type: Article

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