Self-diffusion of boron in TiB2

Journal of Applied Physics

Volumn 93, Issue 2, 2003, Pages 907-911

  Schmidt, H ^a   Borchardt, G ^a   Schmalzried, C ^b   Telle, R ^b   Weber, S ^c   Scherrer, H ^c  

^a CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

^c INSTITUT JEAN LAMOUR   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; BORON; CHEMICAL BONDS; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; DIFFUSION; ENTHALPY; GRAIN BOUNDARIES; ISOTOPES; SECONDARY ION MASS SPECTROMETRY;

DEPTH PROFILING;

TITANIUM COMPOUNDS;

EID: 0037439460     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1530715     Document Type: Article

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