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Volumn 103, Issue 1, 2008, Pages

Accurate characterization of wafer bond toughness with the double cantilever specimen

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT METHOD; INTERFACIAL ENERGY; MATHEMATICAL MODELS; SURFACE TENSION; TOUGHNESS;

EID: 38149076509     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2828156     Document Type: Article
Times cited : (15)

References (18)
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    • A. Plossl and G. Krauter, Mater. Sci. Eng., R. MIGIEA 0927-796X 10.1016/S0927-796X(98)00017-5 25, 1 (1999).
    • (1999) Mater. Sci. Eng., R. , vol.25 , pp. 1
    • Plossl, A.1    Krauter, G.2
  • 9
    • 0000477034 scopus 로고
    • JAPIAU 0021-8979 10.1063/1.1713430.
    • P. P. Gillis and J. J. Gilman, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1713430 35, 647 (1964).
    • (1964) J. Appl. Phys. , vol.35 , pp. 647
    • Gillis, P.P.1    Gilman, J.J.2
  • 11
    • 38149000985 scopus 로고
    • Fracture of Brittle Solids, 2nd ed. (Cambridge University Press, Cambridge, New York).
    • B. R. Lawn, Fracture of Brittle Solids, 2nd ed. (Cambridge University Press, Cambridge, New York, 1993).
    • (1993)
    • Lawn, B.R.1
  • 13
    • 38149138791 scopus 로고    scopus 로고
    • Semiconductor Wafer Bonding: Science and Technology (Wiley, New York).
    • Q. Y. Tong and U. Gösele, Semiconductor Wafer Bonding: Science and Technology (Wiley, New York, 1999).
    • (1999)
    • Tong, Q.Y.1    Gösele, U.2
  • 15
    • 36849141789 scopus 로고
    • JAPIAU 0021-8979 10.1063/1.1713863.
    • J. J. Wortman and R. A. Evans, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1713863 36, 153 (1965).
    • (1965) J. Appl. Phys. , vol.36 , pp. 153
    • Wortman, J.J.1    Evans, R.A.2
  • 16
    • 19944410522 scopus 로고    scopus 로고
    • AMREAD 0003-6900 10.1115/1.1595677.
    • R. Krueger, Appl. Mech. Rev. AMREAD 0003-6900 10.1115/1.1595677 57, 109 (2004).
    • (2004) Appl. Mech. Rev. , vol.57 , pp. 109
    • Krueger, R.1
  • 17


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.