Spectroscopic studies of Nd3+-doped silicon-rich silicon oxide films

Materials Science and Engineering: B

Volumn 146, Issue 1-3, 2008, Pages 179-182

  Breard D ^a   Gourbilleau, F ^a   Dufour, C ^a   Rizk, R ^a   Doualan, J L ^b   Camy, P ^b  

^a Ecole Nationale Supérieure des Ingénieurs de Caen   (France)

^b Centre Interdisciplinaire de Recherche Ions Lasers   (France)

Author keywords

Nd3+ ions; Neodymium; Rare earth doped materials; Si rich silicon oxide

Indexed keywords

ACTIVATION ENERGY; MAGNETRON SPUTTERING; METAL IONS; NEODYMIUM COMPOUNDS; PHOTOLUMINESCENCE; SILICON COMPOUNDS;

LUMINESCENCE DECAYS; ND RADIATIVE TRANSITION; PL INTENSITY; THERMAL ACTIVATION;

OXIDE FILMS;

EID: 37449018778     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.07.107     Document Type: Article

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