Initiated chemical vapor deposition (iCVD) of copolymer thin films

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 678-680

  Lau, Kenneth K S ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Initiated chemical vapor deposition; Methacrylic acid copolymers; pH sensitive release

Indexed keywords

ACIDS; CHEMICAL VAPOR DEPOSITION; COPOLYMERIZATION; COPOLYMERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FREE RADICALS;

COPOLYMER THIN FILMS; INITIATED CHEMICAL VAPOR DEPOSITION; LIQUID PHASE; METHACRYLIC ACID COPOLYMERS;

THIN FILMS;

EID: 36749059458     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.046     Document Type: Article

References (6)

1. Lau K.K., and Gleason K.K. Macromolecules 39 (2006) 3688
2. Lau K.K., and Gleason K.K. Macromolecules 39 (2006) 3695
3. Mao Y., and Gleason K.K. Langmuir 20 (2004) 2484
4. Fineman M., and Ross S.D. J. Polym. Sci. 5 (1950) 259
5. Chan K., and Gleason K.K. Langmuir 21 (2005) 8930
6. Mao Y., and Gleason K.K. Chem. Vap. Depos. 12 (2006) 259