Evaluation of corrosion resistance of SiCN films deposited by HWCVD using organic liquid materials

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 656-658

  Nakayamada, T ^a   Matsuo, K ^a   Hayashi, Y ^a   Izumi, A ^a   Kadotani, Y ^b  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^b Toyo Stainless Polish Industry Co Ltd   (Japan)

Author keywords

Corrosion resistance; Heat resistance; HMDS; Hydrophilicity; SiCN

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CORROSION RESISTANCE; ELLIPSOMETRY; HEAT RESISTANCE; HYDROPHILICITY; SILICON COMPOUNDS; SUBSTRATES;

HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD); ORGANIC LIQUID MATERIALS; ORGANIC LIQUID SOURCES; SUBSTRATE TEMPERATURE;

METALLIC FILMS;

EID: 36748999945     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.184     Document Type: Article

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