Image simulation of extreme ultraviolet lithography optics: Effect of multilayer coatings

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6475-6479

  Yamanashi, Hiromasa ^a   Ito, Masaaki ^a  

^a HITACHI LTD   (Japan)

Author keywords

Amplitude transmission; EUV lithography; Image simulation; Multilayer; Pattern placement accuracy

Indexed keywords

EID: 3643131275     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6475     Document Type: Article

References (11)

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