Optical system for high-throughput EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2723, Issue , 1996, Pages 34-45

  Katagiri, Souichi ^a   Ito, Masaaki ^a   Yamanashi, Hiromasa ^a   Seya, Eiichi ^a   Terasawa, Tsuneo ^a  

^a HITACHI LTD   (Japan)

Author keywords

Condenser; EUV lithography; High throughput; Minimum bounce optics

Indexed keywords

LIGHTING; MIRRORS; OPTICAL SYSTEMS; SYNCHROTRON RADIATION; THROUGHPUT;

IMAGING OPTICS; MAGNIFICATION;

LITHOGRAPHY;

EID: 0030314946     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240487     Document Type: Conference Paper

References (7)