-
1
-
-
3242724267
-
-
JVTBD9 1071-1023 10.1116/1.1714985
-
S. J. Pearton, D. P. Norton, K. Ip, Y. W. Heo, and T. Steiner, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.1714985 22, 932 (2004).
-
(2004)
J. Vac. Sci. Technol. B
, vol.22
, pp. 932
-
-
Pearton, S.J.1
Norton, D.P.2
Ip, K.3
Heo, Y.W.4
Steiner, T.5
-
2
-
-
0035932264
-
-
MSBTEK 0921-5107 10.1016/S0921-5107(00)00604-8
-
D. C. Look, Mater. Sci. Eng., B MSBTEK 0921-5107 10.1016/S0921-5107(00) 00604-8 80, 383 (2001).
-
(2001)
Mater. Sci. Eng., B
, vol.80
, pp. 383
-
-
Look, D.C.1
-
3
-
-
0343602860
-
-
JCRGAE 0022-0248 10.1016/S0022-0248(99)00363-2
-
J. M. Ntep, S. S. Hassani, A. Lusson, A. Tromson-Carli, D. Ballutaud, G. Didier, and R. Triboulet, J. Cryst. Growth JCRGAE 0022-0248 10.1016/S0022- 0248(99)00363-2 207, 30 (1999).
-
(1999)
J. Cryst. Growth
, vol.207
, pp. 30
-
-
Ntep, J.M.1
Hassani, S.S.2
Lusson, A.3
Tromson-Carli, A.4
Ballutaud, D.5
Didier, G.6
Triboulet, R.7
-
4
-
-
0034251174
-
-
MRSBEA 0883-7694
-
T. Minami, MRS Bull. MRSBEA 0883-7694 25, 38 (2000).
-
(2000)
MRS Bull.
, vol.25
, pp. 38
-
-
Minami, T.1
-
5
-
-
0035881692
-
-
THSFAP 0040-6090 10.1016/S0040-6090(01)01167-1
-
A. Nuruddin and J. R. Abelson, Thin Solid Films THSFAP 0040-6090 10.1016/S0040-6090(01)01167-1 394, 49 (2001).
-
(2001)
Thin Solid Films
, vol.394
, pp. 49
-
-
Nuruddin, A.1
Abelson, J.R.2
-
6
-
-
0038136910
-
-
SCIEAS 0036-8075 10.1126/science.1085276
-
J. F. Wager, Science SCIEAS 0036-8075 10.1126/science.1085276 300, 1245 (2003).
-
(2003)
Science
, vol.300
, pp. 1245
-
-
Wager, J.F.1
-
7
-
-
0037104275
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.66.073202
-
C. H. Park, S. B. Zhang, and S.-H. Wei, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.66.073202 66, 073202 (2002).
-
(2002)
Phys. Rev. B
, vol.66
, pp. 073202
-
-
Park, C.H.1
Zhang, S.B.2
Wei, S.-H.3
-
8
-
-
2442702952
-
-
APPLAB 0003-6951 10.1063/1.1711162
-
L. Wang and N. C. Giles, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1711162 84, 3049 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 3049
-
-
Wang, L.1
Giles, N.C.2
-
11
-
-
0043207913
-
-
JAPIAU 0021-8979 10.1063/1.1580193
-
N. Y. Garces, L. Wang, N. C. Giles, L. E. Halliburton, G. Cantwell, and D. B. Eason, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1580193 94, 519 (2003).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 519
-
-
Garces, N.Y.1
Wang, L.2
Giles, N.C.3
Halliburton, L.E.4
Cantwell, G.5
Eason, D.B.6
-
13
-
-
0035880962
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.64.085120
-
Eun-Cheol Lee, Y.-S. Kim, Y.-G. Jin, and K. J. Chang, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.64.085120 64, 085120 (2001).
-
(2001)
Phys. Rev. B
, vol.64
, pp. 085120
-
-
Lee, E.1
Kim, Y.-S.2
Jin, Y.-G.3
Chang, K.J.4
-
14
-
-
0037104275
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.66.073202
-
C. H. Park, S. B. Zhang, and Su-Huai Wei, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.66.073202 66, 073202 (2002).
-
(2002)
Phys. Rev. B
, vol.66
, pp. 073202
-
-
Park, C.H.1
Zhang, S.B.2
Wei, S.3
-
15
-
-
20844433188
-
-
APPLAB 0003-6951 10.1063/1.1931823
-
S. Limpijumnong, X. Li, S.-H. Wei, and S. B. Zhang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1931823 86, 211910 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 211910
-
-
Limpijumnong, S.1
Li, X.2
Wei, S.-H.3
Zhang, S.B.4
-
16
-
-
0026819254
-
-
JAPLD8 0021-4922 10.1143/JJAP.31.L139
-
S. Nakamura, T. Mukai, M. Senoh, and N. Iwasa, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 10.1143/JJAP.31.L139 31, L139 (1992).
-
(1992)
Jpn. J. Appl. Phys., Part 2
, vol.31
, pp. 139
-
-
Nakamura, S.1
Mukai, T.2
Senoh, M.3
Iwasa, N.4
-
17
-
-
1542336951
-
-
JAPIAU 0021-8979 10.1063/1.1639954
-
M. E. Zvanut, D. M. Matlock, R. L. Henry, D. Koleske, and A. Wickenden, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1639954 95, 1884 (2004).
-
(2004)
J. Appl. Phys.
, vol.95
, pp. 1884
-
-
Zvanut, M.E.1
Matlock, D.M.2
Henry, R.L.3
Koleske, D.4
Wickenden, A.5
-
18
-
-
15344350687
-
-
JCRGAE 0022-0248
-
M. Mikami, T. Eto, J. Wang, Y. Masa, and M. Isshiki, J. Cryst. Growth JCRGAE 0022-0248 276, 389 (2005).
-
(2005)
J. Cryst. Growth
, vol.276
, pp. 389
-
-
Mikami, M.1
Eto, T.2
Wang, J.3
Masa, Y.4
Isshiki, M.5
-
19
-
-
28444491101
-
-
APPLAB 0003-6951 10.1063/1.2117630
-
L. E. Halliburton, N. C. Giles, N. Y. Garces, M. Luo, C. Xu, L. Bai, and L. A. Boatner, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2117630 87, 172108 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 172108
-
-
Halliburton, L.E.1
Giles, N.C.2
Garces, N.Y.3
Luo, M.4
Xu, C.5
Bai, L.6
Boatner, L.A.7
-
20
-
-
0344751596
-
-
JAPIAU 0021-8979 10.1063/1.372453
-
M. D. McCluskey, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.372453 87, 3593 (2000).
-
(2000)
J. Appl. Phys.
, vol.87
, pp. 3593
-
-
McCluskey, M.D.1
-
21
-
-
0000989545
-
-
APPLAB 0003-6951 10.1063/1.110325
-
J. A. Wolk, J. W. Ager III, K. J. Duxstad, E. E. Haller, N. R. Taskar, D. R. Dorman, and D. J. Olego, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.110325 63, 2756 (1993).
-
(1993)
Appl. Phys. Lett.
, vol.63
, pp. 2756
-
-
Wolk, J.A.1
Ager III, J.W.2
Duxstad, K.J.3
Haller, E.E.4
Taskar, N.R.5
Dorman, D.R.6
Olego, D.J.7
-
22
-
-
2442437702
-
-
APPLAB 0003-6951 10.1063/1.117202
-
W. Götz, N. M. Johnson, D. P. Bour, M. D. McCluskey, and E. E. Haller, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.117202 69, 3725 (1996).
-
(1996)
Appl. Phys. Lett.
, vol.69
, pp. 3725
-
-
Götz, W.1
Johnson, N.M.2
Bour, D.P.3
McCluskey, M.D.4
Haller, E.E.5
-
23
-
-
0042422920
-
-
JAPIAU 0021-8979 10.1063/1.363661
-
Z. Yu, S. L. Buczkowski, L. S. Hirsch, and T. H. Myers, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.363661 80, 6425 (1996).
-
(1996)
J. Appl. Phys.
, vol.80
, pp. 6425
-
-
Yu, Z.1
Buczkowski, S.L.2
Hirsch, L.S.3
Myers, T.H.4
-
24
-
-
0003957811
-
-
edited by J. I. Pankove and N. M. Johnson (Academic, New York
-
J. Chevallier, B. Clerjaud, and B. Pajot, in Semiconductors and Semimetals, edited by, J. I. Pankove, and, N. M. Johnson, (Academic, New York, 1991), Vol. 34, Chap..
-
(1991)
Semiconductors and Semimetals
, vol.34
-
-
Chevallier, J.1
Clerjaud, B.2
Pajot, B.3
-
25
-
-
17944367172
-
-
APPLAB 0003-6951 10.1063/1.1886256
-
X. Li, B. Keyes, S. Asher, S. B. Zhang, S.-H. Wei, T. J. Coutts, S. Limpijumnong, and C. G. Van de Walle, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1886256 86, 122107 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 122107
-
-
Li, X.1
Keyes, B.2
Asher, S.3
Zhang, S.B.4
Wei, S.-H.5
Coutts, T.J.6
Limpijumnong, S.7
Van De Walle, C.G.8
-
27
-
-
15244342830
-
-
PSSBBD 0370-1972 10.1002/pssb.200409089
-
U. Haboeck, A. Hoffmann, C. Thomsen, A. Zeuner, and B. K. Meyer, Phys. Status Solidi B PSSBBD 0370-1972 10.1002/pssb.200409089 242, R21 (2005).
-
(2005)
Phys. Status Solidi B
, vol.242
, pp. 21
-
-
Haboeck, U.1
Hoffmann, A.2
Thomsen, C.3
Zeuner, A.4
Meyer, B.K.5
-
28
-
-
0038609631
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.90.197402
-
N. H. Nickel and K. Fleischer, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.90.197402 90, 197402 (2003).
-
(2003)
Phys. Rev. Lett.
, vol.90
, pp. 197402
-
-
Nickel, N.H.1
Fleischer, K.2
-
29
-
-
29744439909
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.72.113201
-
S. J. Jokela and M. D. McCluskey, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.72.113201 72, 113201 (2005).
-
(2005)
Phys. Rev. B
, vol.72
, pp. 113201
-
-
Jokela, S.J.1
McCluskey, M.D.2
|