Structural and electrical properties of La0.5Sr0.5CoO3 thin films prepared by rf magnetron sputtering

Journal of Alloys and Compounds

Volumn 449, Issue 1-2, 2008, Pages 68-72

  Asha, A S ^a   Sebastian, M T ^b   Jayaraj, M K ^a  

^a Department of Polymer Science and Rubber Technology   (India)

^b REGIONAL RESEARCH LABORATORY CSIR   (India)

Author keywords

Absorption; Ferroelectrics; X ray diffraction

Indexed keywords

ELECTRIC PROPERTIES; FERROELECTRIC MATERIALS; LANTHANUM COMPOUNDS; MAGNETRON SPUTTERING; STOICHIOMETRY; X RAY DIFFRACTION;

ANNEALING TEMPERATURE; CRYSTALLINITY; DEPOSITION ANNEALING; RF MAGNETRON SPUTTERING;

THIN FILMS;

EID: 36348930487     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2006.01.123     Document Type: Article

References (21)

1. Dat R., Lichtenwalner D.J., Auciello O., and Kingon A.I. Appl. Phys. Lett. 64 (1994) 2673
2. Hren P.D., Rou S.H., Al-Shareef H.N., Ameen M.S., Auciello O., and Kingon A.I. Integr. Ferroelectrics 2 (1992) 311
3. Scott J.F., Araujo C.A., Melnick B.M., Mc Millan L.D., and Zuleeg R. J. Appl. Phys. 70 (1991) 382
4. Ramesh R., Gilchrist H., Sands T., Keramidas V.G., Haakenaasen R., and Fork D.K. Appl. Phys. Lett. 63 (1993) 3592
5. Cheung J.T., Morgan P.E.D., Lowndes D.H., Zheng X.-Y., and Breen J. Appl. Phys. Lett. 62 (1993) 2045
6. Furusawa Y., and Doi H. Jpn. J. Appl. Phys. 38 (1999) 6864
7. Yoon S.-M., Tokumitsu E., and Ishiwara H. Appl. Surf. Sci. 117/118 (1997) 447
8. Chen Y.-F., Sun L., Yu T., Chen J.-X., Zhu Y.-Y., Ming N.B., Chen X.-Y., and Liu Z.-G. Thin Solid Films 269 (1995) 18
9. Hwang K., Lee H., Ryu H., Lim Y., Yamaguchi I., Manabe T., Kamagai T., and Mizuta S. Jpn. J. Appl. Phys. 39 (1999) 6489
10. Ping S., Tong S., Chongruo W., and Yong Xiang L. Ferroelectrics 195 (1997) 249
11. Aggarwal S., Song T.K., Dhote A.M., Prakash A.S., Ramesh R., Velasquez N., Boyer L., and Evans Jr. J.T. J. Appl. Phys. 83 (1998) 1617
12. Madhukar S., Aggarwal S., Dhote A.M., Ramesh R., Krishnan A., Keeble D., and Poindexter E. J. Appl. Phys. 81 (1997) 3543
13. Liu J.M., and Ong C.K. J. Appl. Phys. 84 (1998) 5560
14. Li M., Wang Z.-L., Fan S., Qing-TaiZhau, and Xiong G. Thin Solid Films 323 (1998) 304
15. Meng L.J., and dos Santos M.P. Thin Solid Films 322 (1998) 56
16. Cullity B.D., and Stock S.R. Elements of X-Ray Diffraction (2001), Printice Hall, NJ
17. Mizusaki J., Mima Y., Yamauchi S., Fueki K., and Tagawa H. J. Solid. State Chem. 80 (1989) 102
18. Chen X., Wu N., Ignatiev A., Zhang Z., and Chu W.-K. Thin Solid Films 350 (1999) 130
19. Kim H., Horwitz J.S., Kim W.H., Kafafi Z.H., and Chrisey D.B. J. Appl. Phys. 91 (2002) 5371
20. Kim H., Gilmore C.M., Pique A., Horwitz J.S., Mattoussi H., Murata H., Kafafi Z.H., and Chrisey D.B. J. Appl. Phys. 86 (1999) 6451
21. Sernelius B.E., Berggren K.F., Jin Z.C., Hamberg I., and Granqvist C.G. Phys. Rev. B 37 (1988) 10244