The impact of scanner model vectorization on optical proximity correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 1, 2007, Pages

  Tyminski, Jacek K ^a   Nakashima, Tashiharu ^b   Zhang, Qiaolin ^c   Matsuyama, Tomoyuki ^b   Lucas, Kevin ^c  

^a NIKON PRECISION INC   (United States)

^b NIKON CORPORATION   (Japan)

^c SYNOPSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36248996982     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728968     Document Type: Conference Paper

References (4)

1. Junjiang Lei, Min Bai, Jim Shiely, Lin Zhang, 'A study for polarized illumination effects in photo resist' SPIE Vol. 5853, Photomask and Next-Generation Lithography Mask Technology XII, 2005.
2. James P. McGuire, Jr. and Russell A. Chipman, 'Polarization aberrations. 1. Rotationally symmetric optical systems', Appl. Opt. 33, 5080-5100 (1994).
3. Jacek . K. Tyminski, Tomoyuki Matsuyama, Tashiharu Nakashima, Thomas Schmoeller, John Lewellen, 'Polarization Dependent Proximity Effects', SPIE Optical Microlithography XX, San Jose, 25 February-2 March, 2007, 6520-14.
4. Jacek . K. Tyminski, Qiaolin (Charlie) Zhang, Kevin Lucas, Laurent Depre, Paul VanAdrichem, 'Scanner-Characteristics-Aware OPC Modeling and Correction', SPIE Optical Microlithography XX, San Jose, 25 February-2 March, 2007, 6521-35.