Relationship between structure and deposition conditions for CuInO 2 thin films

Applied Surface Science

Volumn 254, Issue 4, 2007, Pages 1343-1346

  Yaicle, C ^a   Blacklocks, A ^b   Chadwick, A V ^b   Perriere J ^c   Rougier, A ^a  

^a UNIVERSITÉ DE PICARDIE JULES VERNE   (France)

^b UNIVERSITY OF KENT   (United Kingdom)

^c INSTITUT DES NANOSCIENCES DE PARIS   (France)

Author keywords

Copper indium oxide; Delafossite; EXAFS; Oxygen pressure; Pulsed Laser Deposition; Stoichiometry; Thin films

Indexed keywords

COPPER COMPOUNDS; EXTENDED X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY; PULSED LASER DEPOSITION; STOICHIOMETRY;

COPPER INDIUM OXIDE; OXYGEN PRESSURE; OXYGEN STOICHIOMETRY;

THIN FILMS;

EID: 36248958088     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.08.016     Document Type: Article

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