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Volumn 17, Issue 16, 2007, Pages 3105-3110

Patterning semiconductor nanocrystals in polymer films

Author keywords

[No Author keywords available]

Indexed keywords

MIXTURES; MONOMERS; PHASE SEPARATION; POLYMER FILMS; POLYMERIZATION; VISCOSITY;

EID: 36048983223     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.200700409     Document Type: Article
Times cited : (33)

References (45)
  • 37
    • 36048945657 scopus 로고    scopus 로고
    • In order to confirm that patterning occurs due to phase separation between nanocrystals and polymers, in the series of control experiment. we polymerized EHMA under similar conditions used to make our patterned films. The polymerization was quenched at various times to yield mixtures of polymer of varying molecular weights and unreacted monomer, We found that the nanocrystals could not be dispersed in the polymer/monomer mixtures that were quenched after 6 minu of polymerization. This result indicated that the NCs are not stable in mixtures of polymer and monomer prepared under short polymerization times. In addition, we can rule out the effect of photobleaching as the mechanism for pattern formation by examining the optical micrographs. The optical micrographs (see Figs. 5 and 6) reveal patterns of dark areas (high concentration of nanocrystals, and bright areas (low concentration of nanocrystals) indicating that the patterns observed in CFM are not formed by photobleaching
    • In order to confirm that patterning occurs due to phase separation between nanocrystals and polymers, in the series of control experiment. we polymerized EHMA under similar conditions used to make our patterned films. The polymerization was quenched at various times to yield mixtures of polymer of varying molecular weights and unreacted monomer, We found that the nanocrystals could not be dispersed in the polymer/monomer mixtures that were quenched after 6 minu of polymerization. This result indicated that the NCs are not stable in mixtures of polymer and monomer prepared under short polymerization times. In addition, we can rule out the effect of photobleaching as the mechanism for pattern formation by examining the optical micrographs. The optical micrographs (see Figs. 5 and 6) reveal patterns of dark areas (high concentration of nanocrystals), and bright areas (low concentration of nanocrystals) indicating that the patterns observed in CFM are not formed by photobleaching.
  • 39
    • 36049040931 scopus 로고    scopus 로고
    • Since CdSe-ZnS NCs absorb a significant fraction of the excitation light used for CFM imaging, artifacts were created when images were captured at depths greater than 50 μm. Therefore, he images were acquired by imaging the planes located 30 μm from the top and the bottom surfaces of the patterned film.
    • Since CdSe-ZnS NCs absorb a significant fraction of the excitation light used for CFM imaging, artifacts were created when images were captured at depths greater than 50 μm. Therefore, he images were acquired by imaging the planes located 30 μm from the top and the bottom surfaces of the patterned film.
  • 40
    • 36048949254 scopus 로고    scopus 로고
    • We ascribe the smearing of the pattern in one direction to the cell design and the changes in of the monomer mixture during polymerization. The cell had inlets in line with the direction of smearing. The decrease in the during polymerization caused monomer to now towards the locus of polymerization. Therefore, the decrease in could cause monomer to flow in the direction of the inlets, causing stronger smearing effects in the patterned films. This effect was pronounced in the films prepared from EHMA, due to the slower polymerization in comparison to EHA and BMA
    • We ascribe the smearing of the pattern in one direction to the cell design and the changes in volume of the monomer mixture during polymerization. The cell had inlets in line with the direction of smearing. The decrease in the volume during polymerization caused monomer to now towards the locus of polymerization. Therefore, the decrease in volume could cause monomer to flow in the direction of the inlets, causing stronger smearing effects in the patterned films. This effect was pronounced in the films prepared from EHMA, due to the slower polymerization in comparison to EHA and BMA.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.