Deposit of dense YSZ electrolyte and porous NiO-YSZ anode for SOFC device by a low pressure plasma process

Surface and Coatings Technology

Volumn 202, Issue 4-7, 2007, Pages 1226-1230

  Rousseau, F ^a   Awamat, S ^a   Nikravech, M ^a   Morvan, D ^a   Amouroux, J ^a  

^a SORBONNE UNIVERSITÉ   (France)

Author keywords

Cold plasma process; Gradient of concentration; Low pressure plasma; Nio YSZ layer; SOFC

Indexed keywords

ANODES; ENERGY DISPERSIVE SPECTROSCOPY; NICKEL OXIDE; PLASMA APPLICATIONS; POROSITY; SYNTHESIS (CHEMICAL); YTTRIA STABILIZED ZIRCONIA;

COLD PLASMA PROCESS; LOW PRESSURE PLASMA; PLASMA DISCHARGE;

SOLID OXIDE FUEL CELLS (SOFC);

ANODES; ENERGY DISPERSIVE SPECTROSCOPY; NICKEL OXIDE; PLASMA APPLICATIONS; POROSITY; SOLID OXIDE FUEL CELLS (SOFC); SYNTHESIS (CHEMICAL); YTTRIA STABILIZED ZIRCONIA;

EID: 36048966343     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.07.089     Document Type: Article

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