Application results achieved with LINUX Cluster for data preparation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 672-680

  Gramss, Juergen ^a   Lemke, Melchior ^a   Eichhorn, Hans ^a   Neick, Volker ^a   Kramer, Michael ^b   Stache, Erhard ^b  

^a Vistec Electron Beam GmbH   (Germany)

^b PHOTRONICS INC   (United States)

Author keywords

Cluster; Compute CPUs; Distributed computing; HpcLine; LINUX; MGS; MPI; PROXECCO; Variable shaped beam systems; VSB

Indexed keywords

BANDWIDTH; BENCHMARKING; COMPUTER OPERATING SYSTEMS; COMPUTER SOFTWARE; COST EFFECTIVENESS; DATA PROCESSING; LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

CLUSTER; COMPUTE CPUS; DISTRIBUTED COMPUTING; LINUX; MASK DATA GENERATION SYSTEM (MGS); MESSAGE PASSING INTERFACE (MPI); PARALLEL VIRTUAL MACHINE (PVM); PROXIMITY EFFECT CORRECTION (PROXECCO); VARIABLE-SHAPED BEAM WRITERS (VSB);

MASKS;

EID: 1642474099     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504219     Document Type: Conference Paper

References (6)

1. th July 2001, San Francisco, http://www.sematech.org/public/news/conferences/maskeda/P_LEICA.pdf
2. st Symposium on Photomask Technology, Monterey, USA, 2001, Proc. SPIE, vol. 4562, page 88-98
3. Dirk Beyer, Hans-Joachim Doering, Lutz Bettin, Monika Boettcher, Michael Gehre, Bernd Schnabel, Thomas Haendel, Joachim Heinitz, Michael Hopp "Evaluation of a 100nm Mask Writing Tool"; SEMICON Europe, Munich, Germany, 2002
4. th European Mask Conference EMC 2002, Munich, Germany, VDE Verlag GmbH, GMM Fachbericht 36, page 57-66
5. Nicola Belie, Renate Jaritz, Peter Hudek, Hans Eisenmann "Efficient E-Beam Proximity Correction for High Acceleration Voltages", SEMICON Europe, Munich, 2002
6. th European Mask Conference EMC 2000, Munich, Germany, VDE Verlag GmbH, GMM Fachbericht 32, page 157-162