Fabrication of c-axis oriented higher manganese silicide by a high-magnetic-field and its thermoelectric properties

Journal of Materials Research

Volumn 22, Issue 10, 2007, Pages 2917-2923

  Kaga, Hisahi ^a   Kinemuchi, Yoshiaki ^a   Watari, Koji ^a   Tanaka, Satoshi ^b   Makiya, Atsushi ^b   Kato, Zenji ^b   Uematsu, Keizo ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; DENSIFICATION; ELECTRIC CONDUCTIVITY; FABRICATION; HEAT TREATMENT; MAGNETIC FIELD EFFECTS; SPARK PLASMA SINTERING; THERMOELECTRICITY;

GRAIN ALIGNMENT; HIGHER MANGANESE SILICIDE;

MANGANESE COMPOUNDS;

EID: 35448952244     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2007.0360     Document Type: Article

References (22)

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