Chemical-assisted mechanical polishing of diamond film on wafer

Materials Science Forum

Volumn 505-507, Issue PART 2, 2006, Pages 1225-1230

  Hocheng, H ^a   Chen, C C ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Diamond film; Material removal rate; Polishing; Surface roughness

Indexed keywords

CHEMICAL VAPOR DEPOSITION; POLISHING; POTASSIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

MATERIAL REMOVAL RATE; NON-UNIFORM THICKNESS; POTASSIUM PERMANGANATE;

DIAMOND FILMS;

EID: 35348847164     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.505-507.1225     Document Type: Conference Paper

References (6)

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