Doped tin oxide nanometric films for environment monitoring

Materials Science Forum

Volumn 498-499, Issue , 2005, Pages 636-641

  Falla, P Hidalgo ^a   Peres, H E M ^a   Gouvea D ^a   Ramirez Fernandez, F J ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

Gas sensors; Integrated sensors; Sulphur dioxide; Tin oxide

Indexed keywords

CHEMICAL SENSORS; SUBSTRATES; SULFUR DIOXIDE; TIN OXIDES; X RAY DIFFRACTION ANALYSIS;

ALUMINA SUBSTRATE; INTEGRATED SENSORS;

METALLIC FILMS;

EID: 35248817333     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-984-9.636     Document Type: Conference Paper

References (10)

1. Pechini, M. USPat., N°3330697, 1967.
2. W. Gopel, J. Hesse, J. N. Zemel, Sensors, VHC, 2-3 (1991).
3. J. W. Gardner, Semicond. Sci. Technol., 4 (1989), p. 345-350.
4. I. Sayago, J. Gutiérrez, L. Ares, J. I. Robla,M. C. Horrillo, J. Getino, J. Rino, J. A. Agapito, Sens, and Act. B 26-27 (1995), p. 19-23.
5. P. Hidalgo, D. Gouvêa, F. J. Ramirez-Fernandez, H. E. M Peres, I SBPmat 2002 - Rio de Janeiro.
6. S. Harbeck, A. Szatvanyi, N. Barsan, N., U. Weimar, V. Hoffmann, Thin Solid Films 436 (2003), p. 76-83.
7. S. Shukla, S. Seal, L. Ludwig, C. Parish, Sens, and Act. B 97 (2004), p. 256-265.
8. M. Heule, L. J. Gauckler, Sens, and Act. B 93 (2003), p. 100-106.
9. H. P. Klug, L. E. Alexander, X-Ray Diffraction Procedures, Wiley, (1974).
10. http://www.atsdr.cdc.gov/tfacts116.html