Patterning effect and correlated electrical model of post-OPC MOSFET devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6521, Issue , 2007, Pages

  Cheng, Y C ^a   Ou, T H ^a   Wu, M H ^a   Wang, W L ^a   Feng, J H ^a   Huang, W C ^a   Lai, C M ^a   Liu, R G ^a   Ku, Y C ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

ADI; CD; DFM; DRC; MOSFET

Indexed keywords

COMPUTER SIMULATION; ETCHING; INTEGRATED CIRCUITS; MOSFET DEVICES; PATTERN RECOGNITION; SPICE;

DESIGN FLOW; DESIGN FOR MANUFACTURING; DESIGN RULE CHECK; ELECTRICAL MODEL; HOTSPOT CRITERION; PATTERNING EFFECT;

PHOTOLITHOGRAPHY;

EID: 35148860623     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.717254     Document Type: Conference Paper

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