Effects of substitution of Ti for Fe in BiFeO3 films prepared by sol-gel process

Physica B: Condensed Matter

Volumn 400, Issue 1-2, 2007, Pages 252-256

  Hongri, Liu ^a   Zuli, Liu ^b   Xiaolu, Li ^a,b   Kailun, Yao ^a,b  

^a HUBEI NORMAL UNIVERSITY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

BiFe1 xTixO3+ films; Dielectric property; Ferroelectricity; Leakage conduction; Sol gel; Ti substitution

Indexed keywords

ANNEALING; BISMUTH COMPOUNDS; DIELECTRIC PROPERTIES; INDIUM COMPOUNDS; PEROVSKITE; SUBSTITUTION REACTIONS;

GLASS SUBSTRATES; INDIUM TIN OXIDE; LEAKAGE CONDUCTION;

FERROELECTRIC FILMS;

EID: 35148857753     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2007.07.018     Document Type: Article

References (20)

1. Fiebig M., Lottermoser T., Frohlich D., Goltsev A.V., and Pisarev R.V. Nature 419 (2002) 818
2. Kumar M.M., Palkar V.R., Srinivas K., and Suryanarayana S.V. Appl. Phys. Lett. 76 (2000) 2764
3. Sosnowska I., Neumaier T.P., and Steichele E. J. Phys. C 15 (1982) 4835
4. Kubel F., and Schmid H. Acta Crystallogr. B: Struct. Sci. 46 (1990) 698
5. Palkar V.R., John J., and Pinto R. Appl. Phys. Lett. 80 (2002) 1628
6. Matsui T., Taketani E., Tsuda H., Fujimura N., and Morii K. Appl. Phys. Lett. 86 (2005) 082902
7. Liu H., Liu Z., Liu Q., and Yao K. Thin Solid Films 500 (2006) 105
8. Qi X., Dho J., Tomov R., Blamire M.G., and MacManus-Driscoll J.L. Appl. Phys. Lett. 86 (2005) 062903
9. Wang Y., Jiang Q.H., He H.C., and Nan C.W. Appl. Phys. Lett. 88 (2006) 142503
10. Iakovlev S., Solterbeck C.H., Kuhnke M., and Es-Souni M. J. Appl. Phys. 97 (2005) 094901
11. Singh S.K., Kim Y.K., Funakubo H., and Ishiwara H. Appl. Phys. Lett. 88 (2006) 162904
12. Zhang S.T., Zhang Y., Lu M.H., Du C.L., Chen Y.F., Liu Z.G., Zhu Y.Y., and Ming N.B. Appl. Phys. Lett. 88 (2006) 162901
13. Shimakawa Y., Kubo Y., Tauchi Y., Asano H., Kamiyama T., Izumi F., and Hiroi Z. Appl. Phys. Lett. 79 (2001) 2791
14. Shimakawa Y., Kubo Y., Nakagawa Y., Kamiyama T., Asano H., and Izumi F. Appl. Phys. Lett. 74 (1999) 1904
15. Li W., Gu J., Song C., Su D., and Zhu J. Appl. Phys. Lett. 98 (2005) 114104
16. Chopra S., Sharma S., Goel T.C., and Mendiratta R.G. Solid State Commun. 127 (2003) 229
17. Wang J., Tang X.G., Chan H.L.W., Choy C.L., and Luo H. Appl. Phys. Lett. 86 (2005) 152907
18. Yun K.Y., Noda M., and Okuyama M. Appl. Phys. Lett. 83 (2003) 3981
19. Joo J.H., Seon J.M., Jeon Y.C., Oh K.Y., and Roh J.S. Appl. Phys. Lett. 70 (1997) 3053
20. Fox G.R., and Krupanidhi S.B. J. Appl. Phys. 74 (1993) 1949