Development of high-performance multi-layer resist process with hardening treatment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Ono, Yoshiharu ^a   Ishibashi, Takeo ^a   Yamaguchi, Atsumi ^a   Hanawa, Tetsuro ^a   Tadokoro, Masahiro ^a   Yoshikawa, Kazunori ^a   Yonekura, Kazumasa ^a   Matsuda, Keiko ^b   Matsunobe, Takeshi ^b   Fujii, Yasushi ^c   Tanaka, Takeshi ^c  

^a RENESAS TECHNOLOGY CORP   (Japan)

^b TORAY RESEARCH CENTER INC   (Japan)

^c TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

ArF immersion lithography; H2 plasma; Multi layer resist; Reflectivity control; Spin on carbon

Indexed keywords

DRY ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDENING; MULTILAYER FILMS; PLASMA ETCHING; REFLECTION;

ARF IMMERSION LITHOGRAPHY; ETCHING DURABILITY; H2 PLASMA; MULTILAYER RESISTS; REFLECTIVITY CONTROL; SPIN ON CARBON;

PHOTORESISTS;

EID: 35148821113     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.707615     Document Type: Conference Paper

References (7)

1. J. Hah, Y. Chae, Y. Jang, M. Ryoo, S. Choi, S. Woo, H. Cho, and J. Moon, Proceedings of SPIE, 6153, 61530L, 2006.
2. V. Sipani, Y. Hishiro and M. Abatchev, Proceedings of SPIE, 6153, 61532U, 2006.
3. K. Lee, S. Kim, G. Lee, S. Lee, J. Cho, W. Kim, C. Bok, H. Kim, S. Moon and J. Kim, Proceedings of SPIE, 6153, 61532V, 2006.
4. K. Lee, G. Lee, S. Kim, S. Lee, J. Cho, W. Kim, C. Bok, S. Moon and J. Kim, J. Photopolymer Sci. Technol., 19, 323, 2006.
5. J. Abe, H. Hayashi, Y. Taniguchi, H. Kato, Y. Onishi, I. Sakai and T. Ohiwa, Proceedings of Symposium Dry Process 12, 2005.
6. N. Nagai, Anal. Sci. Suppl., 17, i671, 2001
7. K. Yonekura, K. Yoshikawa, Y. Fujiwara, S. Sakamori, N. Fujiwara, T. Kosaka, M. Ohkuni and K. Tateiwa, Thin Solid Films, 2006, doi:10.1016/j.tsf.2006.10.037