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Volumn 492-493, Issue , 2005, Pages 123-128

Properties of Cu-W functionally graded materials produced by segregation and infiltration

Author keywords

Cu W graded material; Electrical resistivity; Segregation; Sintering

Indexed keywords

ELECTRIC RESISTANCE; INFILTRATION; MICROSTRUCTURE; POROSITY; SEGREGATION (METALLOGRAPHY); SINTERING;

EID: 35048882962     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Conference Paper
Times cited : (6)

References (15)
  • 13
    • 35048867401 scopus 로고    scopus 로고
    • D. Jankovid Ilić, J. Fiscina, C.J.R.González-Oliver, F. Mücklich: submitted to J. Material Science under number JMS 11204-03.
    • D. Jankovid Ilić, J. Fiscina, C.J.R.González-Oliver, F. Mücklich: submitted to J. Material Science under number JMS 11204-03.
  • 15
    • 35048859781 scopus 로고    scopus 로고
    • C.Scorey: U.S.Patent 5, 292, 478, Mar.8, (1994).
    • C.Scorey: U.S.Patent 5, 292, 478, Mar.8, (1994).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.