Positive- and negative-tone water-processable photoresists: A progress report

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 245-253

  Yamada, Shintaro ^a   Medeiros, David R ^a   Patterson, Kyle ^a   Jen, Wei Lun K ^a   Rager, Timo ^a   Lin, Qinghuang ^a,d   Lenci, Carlos ^a,e   Byers, Jeff D ^b   Havard, Jennifer M ^c   Pasini, Dario ^c   Fréchet, Jean M J ^c   Willson, C Grant ^a  

^a Section of Molecular Genetics and Microbiology   (United States)

^b SEMATECH   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d IBM MICROELECTRONICS   (United States)

^e APPLIED MATERIALS INC   (United States)

Author keywords

Photoresist; Polarity switch; Vinyl ether; Water soluble

Indexed keywords

ACIDS; AMMONIUM COMPOUNDS; ETHERS; GROUP TECHNOLOGY; ORGANIC COMPOUNDS; PHOTORESISTORS; POLYMER FILMS; POLYMERS; POLYSTYRENES; SCHEDULING; SOLUBILITY; STYRENE; SURFACE TREATMENT; TERNARY SYSTEMS;

ACID-LABILE; ACIDIC HYDROXYL GROUPS; CROSS LINKERS; CROSSLINK; CROSSLINKED; DRY-ETCH; MATRIX POLYMERS; NEGATIVE TONES; PENDANT GROUPS; PINACOL; POLARITY SWITCH; POSITIVE TONES; PROCESSABLE; PROGRESS REPORTS; RESIST SYSTEMS; STYRENE COPOLYMERS; SULFONATE GROUPS; THERMALLY ACTIVATED; VINYL ETHER; WATER SOLUBLE;

SWITCHES;

EID: 34848828969     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312414     Document Type: Conference Paper

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