A novel water developable photoresist for deep UV lithography

European Polymer Journal

Volumn 33, Issue 8, 1997, Pages 1239-1243

  Kim, Jin Baek ^a   Jung, Min Ho ^a   Chang, Kyeong Ho ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039054143     PISSN: 00143057     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0014-3057(96)00278-9     Document Type: Article

References (15)

1. Jain K., Lin B. J. and Willson C. G., IBM J. Res. Dev. 1982, 26, 151.
2. Pol V., Bennewitz J. H. and Escher G. C., Proc. SPIE. 1986, 633, 6.
3. Endo M., Sasago M., Hirai Y., Ogawa K. and Ishihara T., Proc. SPIE, 1987, 774, 138.
4. Ito H. and Willson C. G., Polymers in Electronics, ed. T. Davidson. ACS Symposium Series No. 242, American Chemical Society, Washington, DC, p. 11.
5. Frechet J. M., Eichler E., Ito H. and Willson C. G., Polymer 1983, 24, 995.
6. Willson C. G., Ito H., Frechet J. M., Tessier T. G. and Houlihan F. M., J. Electrochem. Soc. 1986, 133, 181.
7. Frechet J. M., Eichler E., Stanciulescu M., Iizawa T., Bouchard F., Houlihan F. M. and Willson C. G., Polymers for High Technology, ed. M. J. Bouden and S. R. Turner. ACS Symposium Series No. 346, American Chemical Society, Washington, DC, 1987, p. 139.
8. Ito H., Willson C. G. and Frechet J. M., SPIE, 1987, 771, 24.
9. Crivello J. V., Lee J. L. and Gonlon D. A., J. Polym. Sci.; Polym. Chem. Ed. 1987, 25, 3293.
10. Allen R. D., Wallraff G. M., Hinsberg W. D. and Simpson L. L., J. Vac. Sic. Technol. 1991, B9, 3357.
11. Crivello J. V. and Shim S. Y., J. Polym. Sci.; Polym. Chem. Ed. 1995, 33, 513.
12. Kaimoto Y., Nozaki K., Takechi S. and Ave N., Proc. SPIE, 1992, 1672, 66.
13. Dekar J. L. and Hacker N. P., J. Am. Chem. Soc. 1990, 112, 6004.
14. Wildi B. S., Taylor S. W. and Potratz H. A., J. Am. Chem. Soc. 1951, 73, 1965.
15. Crivello J. V. and Lam J. H. W., J. Org. Chem. 1978, 43, 3055.