Deep etched DBR gratings in InP for photonic integrated circuits

Conference Proceedings - International Conference on Indium Phosphide and Related Materials

Volumn , Issue , 2007, Pages 226-228

  Docter, B ^a   Geluk, E J ^a   Sander Jochem, M J H ^a   Karouta, F ^a   Smit, M K ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; ETCHING; INDIUM PHOSPHIDE; OPERATING COSTS; PHOTOLITHOGRAPHY; PHOTONICS; SILICA;

PHOTONIC CIRCUITS; PRODUCTION COST;

POWER INTEGRATED CIRCUITS;

EID: 34748867202     PISSN: 10928669     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICIPRM.2007.381164     Document Type: Conference Paper

References (4)

1. K.J. Kasunic, "Design Equations for the Reflectivity of Deep-Etch Distributed Bragg Reflector Gratings", J. of Lightwave Techa, Vol. 18, No. 3, 2000
2. T. Baba et al., "A Novel Short-Cavity Laser with Deep-Grating Distributed Bragg Reflectors", Jpn. J. Appl. Phys., Vol. 35, 1996
3. J.H. Den Besten, et al. "An integrated 4×4-channel multi-wavelength laser on InP". IEEE Phot. Techn. Lett., Vol. 15, nr. 3, 2003
4. K.H. Smith, et al. "Cr absorber etch process for extreme ultraviolet lithography mask fabrication", J. Vac. Sci. Techn. B, Vol. 19, nr. 6, 2001