Positive pattern formation and its mechanism from ionic bonded negative photosensitive polyimide

Journal of Photopolymer Science and Technology

Volumn 20, Issue 2, 2007, Pages 145-147

  Yoshida, Satoshi ^a   Eguchi, Masuichi ^a   Tamura, Kazutaka ^a   Tomikawa, Masao ^a  

^a TORAY INDUSTRIES INC   (Japan)

Author keywords

Imidization control; Photosensitive amine; Poly(amic acid)

Indexed keywords

EID: 34548612473     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.145     Document Type: Article

References (5)

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4. M. Tomikawa, et. al., J. Photopolymer Sci. & Technol., 5 (1992), 343
5. Nielsen, L. E., "Mechanical Polymers and Composites", Marcel Dekker, New York (1975)