Characterization of LaVOx thin films by photoemission spectroscopy

Journal of Applied Physics

Volumn 102, Issue 5, 2007, Pages

  Wadati, H ^a,b   Hotta, Y ^a   Takizawa, M ^a   Fujimori, A ^a   Susaki, T ^a   Hwang, H Y ^a,c  

^a UNIVERSITY OF TOKYO   (Japan)

^b UNIVERSITY OF BRITISH COLUMBIA   (Canada)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC STRUCTURE; FILM GROWTH; LANTHANUM COMPOUNDS; PHASE TRANSITIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

MIXED PHASE REGIME; POLAR CATASTROPHE; THIN-FILM SURFACES;

THIN FILMS;

EID: 34548611036     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2775889     Document Type: Article

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