Ferromagnetic semiconductor Ge1-x Crx Te with a Curie temperature of 180 K

Applied Physics Letters

Volumn 91, Issue 9, 2007, Pages

  Fukuma, Y ^a,c   Asada, H ^b   Moritake, N ^b   Irisa, T ^b   Koyanagi, T ^b  

^a Yamaguchi Prefectural Industrial Technology Institute   (Japan)

^b YAMAGUCHI UNIVERSITY   (Japan)

^c UNIVERSITY OF ALABAMA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURIE TEMPERATURE; FERROMAGNETIC MATERIALS; HALL EFFECT; MAGNETIC ANISOTROPY; MAGNETIZATION; MAGNETORESISTANCE; MOLECULAR BEAM EPITAXY;

FLUX RATIO; NONSTOICHIOMETRIC DEFECTS;

MAGNETIC SEMICONDUCTORS;

EID: 34548439420     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2772669     Document Type: Article

References (19)

1. H. Munekata, H. Ohno, S. von Molnár, A. Segmuller, L. L. Chang, and L. Esaki, Phys. Rev. Lett. 63, 1849 (1989).
2. H. Ohno, A. Shen, F. Matsukura, A. Oiwa, A. Endo, S. Katsumoto, and Y. Iye, Appl. Phys. Lett. 69, 363 (1996).
3. K. Y. Wang, R. P. Campion, K. W. Edmonds, M. Sawicki, T. Dietl, C. T. Foxon, and B. L. Gallagher, AIP Conf. Proc. 772, 333 (2005).
4. K. Ando, Appl. Phys. Lett. 82, 100 (2003).
5. J. K. Furdyna, J. Appl. Phys. 64, R29 (1988).
6. W. J. M. de Jonge and H. J. M. Swagten, J. Magn. Magn. Mater. 100, 322 (1991).
7. Y. Fukuma, T. Murakami, H. Asada, and T. Koyanagi, Physica E (Amsterdam) 10, 273 (2001).
8. Y. Fukuma, H. Asada, T. Taya, T. Irisa, and T. Koyanagi, Appl. Phys. Lett. 89, 152506 (2006).
9. Y. Fukuma, H. Sato, K. Fujimoto, K. Tsuji, A. Kimura, M. Taniguchi, S. Senba, A. Tanaka, H. Asada, and T. Koyanagi, J. Appl. Phys. 99, 08D510 (2006).
10. R. W. Cochrane, M. Plischke, and J. O. Strom-Olsen, Phys. Rev. B 9, 3013 (1974).
11. Y. Fukuma, M. Arifuku, H. Asada, and T. Koyanagi, Appl. Phys. Lett. 91, 7502 (2002).
12. Y. Fukuma, H. Asada, N. Nishimura, and T. Koyanagi, J. Appl. Phys. 93, 4034 (2003).
13. Y. Fukuma, H. Asada, and T. Koyanagi, Appl. Phys. Lett. 88, 032507 (2006).
14. C. M. Hurd, in The Hall Effect and Its Application, edited by, C. L. Chien, and, C. R. Westgate, (Plenum, New York, 1980), Chap., pp. 1-54.
15. T. R. Mcguire and R. I. Potter, IEEE Trans. Magn. 11, 1018 (1975).
16. K. Y. Wang, K. W. Edmonds, R. P. Campion, L. X. Zhao, C. T. Foxon, and B. L. Gallagher, Phys. Rev. B 72, 085201 (2005).
17. Y. H. Zhao, W. H. Xie, L. F. Zhu, and B. G. Liu, J. Phys.: Condens. Matter 18, 10259 (2006).
18. Z. Feit, M. McDonald, R. Woods, V. Archembault, and P. Mak, Appl. Phys. Lett. 68, 738 (1996).
19. T. Schwarzl, G. Springholz, M. Böberl, E. Kaufmann, J. Roither, W. Heiss, J. Fürst, and H. Pascher, Appl. Phys. Lett. 86, 031102 (2005).