WA3300 - High-speed in-line AFM system for 45-nm node LSIs

Hitachi Review

Volumn 56, Issue 3, 2007, Pages 52-56

  Kurenuma, Toru ^a,b,c,d   Kembo, Yukio ^b,c,e,f,g,h   Morimoto, Takafumi ^a,b,i   Watanabe, Masahiro ^e,f,g,h,j  

^a Hitachi Construction Machinery Co Ltd   (Japan)

^b Hitachi Kenki FineTech Co Ltd

^c Japan Society of Mechanical Engineers (JSME)

^d Robotics Society of   (Japan)

^e HITACHI LTD   (Japan)

^f Japan Society for Precision Engineering (JSPE)

^g Japan Society for Precision Engineering ^*

^h IEEE

ⁱ JAPAN SOCIETY OF APPLIED PHYSICS   (Japan)

^j Production Engineering Research Laboratory

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Author keywords

[No Author keywords available]

Indexed keywords

EID: 34548331954     PISSN: None     EISSN: 0018277X     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (3)

1. S. Hosaka et al., "New AFM Imaging for Observing a High Aspect Structure," Appl. Surf. Sci. (2002).
2. M. Watanabe et al., "An Advanced AFM Sensor for High-Aspect Ratio Pattern Profile In-line Measurement," Proc. of SPIE: Metrology, Inspection, and Process Control for Microlithography, Mar. 24 (2006).
3. S. Baba et al., "An In-line AFM for Semiconductor Inspection," Proc. LSI Testing Symposium/2006, pp. 35-40 (Nov. 2006).