On the formation of a barrier discharge in excilamps

Technical Physics

Volumn 52, Issue 8, 2007, Pages 1046-1052

  Lomaev, M I ^a   Tarasenko, V F ^a   Schitz, D V ^a  

^a INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 34548071613     PISSN: 10637842     EISSN: None     Source Type: Journal    
DOI: 10.1134/S1063784207080142     Document Type: Article

References (16)

1. U. Kogelschatz, Plasma Chem. Plasma Process. 23, 1 (2003).
2. U. Kogelschatz, H. Esrom, J.-Y. Zhang, and I. W. Boyd, App. Surf. Sci. 168, 29 (2000).
3. M. I. Lomaev, V. S. Skakun, A. E. Sosnin, et al., Usp. Fiz. Nauk 173, 201 (2003) [Phys. Usp. 46, 193 (2003)].
4. G. N. Rokhlin, Discharge Sources of Light (Énergoatomizdat, Moscow, 1991) [in Russian].
5. V. F. Tarasenko, M. I. Lomaev, D. V. Schitz, et al., Proc. SPIE 4760, 714 (2002).
6. V. F. Tarasenko, D. V. Shitz, and M. I. Lomaev, Izv. Vyssh. Uchebn. Zaved., Fiz., No. 7, 94 (2003).
7. M. I. Lomaev, V. F. Tarasenko, A. N. Tkachev, et al., Zh. Tekh. Fiz. 74(6), 129 (2004) [Tech. Phys. 49, 790 (2004)].
8. S. N. Buranov, V. V. Gorokhov, V. I. Karelin, and P. B. Repin, Zh. Tekh. Fiz. 74(10), 40 (2004) [Tech. Phys. 49, 1284 (2004)].
9. A. Sublet, C. Ding, J.-L. Dorier, et al., Plasma Sources Sci. Technol. 15, 627 (2006).
10. P. Zhang and U. Kortshagen, J. Phys. D: Appl. Phys. 39, 153 (2006).
11. M. I. Lomaev, Opt. Atmos. Okeana 14, 1091 (2001).
12. T. C. Manley, Trans. Electrochem. Soc. 84, 83, (1943).
13. Yu. P. Raizer, Gas Discharge Physics (Nauka, Moscow, 1987; Springer, Berlin, 1991).
14. Z. Falkenstein and J. J. Coogan, J. Phys. D: Appl. Phys. 30, 817 (1997).
15. S. Liu and M. Neiger, J. Phys. D: Appl. Phys. 34, 1632 (2001).
16. J.-Y. Zhang and I. W. Boyd, J. Appl. Phys. 80, 633 (1996).