Oxygen-plasma treatment of indium-tin oxide in a triode glow discharge

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 B, 2006, Pages 8517-8520

  Kudo, Yusuke ^a   Kusabiraki, Minoru ^a  

^a Osaka City University   (Japan)

Author keywords

Contact angle; Indium tin oxide; Organic EL device; Oxygen plasma; Triode glow discharge; XPS

Indexed keywords

CONTACT ANGLE; ELECTROLUMINESCENCE; GLOW DISCHARGES; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

INDIUM TIN OXIDE (ITO); OPERATING VOLTAGE; ORGANIC EL DEVICE; TRIODE GLOW DISCHARGE;

INDIUM COMPOUNDS;

EID: 34547912911     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.8517     Document Type: Article

References (10)

1. C. W. Tang and S. A. VanSlyke: Appl. Phys. Lett. 51 (1987) 913.
2. S. Miyata, Y. Sakuratani and X. T. Tao: Opt. Mater. 21 (2002) 99.
3. M. Ishii, T. Mori, H. Fujikawa, S. Tolotp and Y. Taga: J. Lumin. 87-89 (2000) 1165.
4. P. He, S. D. Wang, W. K. Wong, L. F. Cheng, C. S. Lee, S. T. Lee and S. Y. Liu: Chem. Phys. Lett. 370 (2003) 795.
5. Y. Kudo and M. Kusabiraki: Mem. Fac. Eng., Osaka City Univ. 45 (2004) 17.
6. K. Hayama, Y. Maekawa and M. Kusabiraki: Mem. Fac. Eng., Osaka City Univ. 46 (2005) 21.
7. M. Kusabiraki: Jpn. J. Appl. Phys. 29 (1990) 2809.
8. L. Chkoda, C. Heske, M. Sokolowski, E. Umbach, F. Steuber, J. Staudigel, M. Stößel and J. Simmerer: Synth. Met. 111-112 (2000) 315.
9. C. C. Anamelechi, G. A. Truskey and W. M. Reichert: Biomaterials 26 (2005) 6887.
10. S. Fujita, T. Sakamoto, K. Ueda, K. Ohta and S. Fujita: Jpn. J. Appl. Phys. 36 (1997) 350.