New design concept and fabrication process for three-dimensional silicon photonic crystal structures

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 2, 2007, Pages 633-637

  Hippo, Daihei ^a,c   Urakawa, Kei ^b   Kawata, Yoshiyuki ^a   Tsuchiya, Yoshishige ^a,c   Mizuta, Hiroshi ^a,c   Koshida, Nobuyoshi ^b,c   Oda, Shunri ^a,c  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

3D photonic crystal; Anodization; Nanostructure fabrication; Photonic band gap; Two directional etching processes

Indexed keywords

ANODIC OXIDATION; CRYSTAL STRUCTURE; ELECTROCHEMICAL ETCHING; MAGNETIC FIELD EFFECTS; PHOTONIC BAND GAP;

3D PHOTONIC CRYSTAL; NANOSTRUCTURE FABRICATION; TWO DIRECTIONAL ETCHING PROCESSES;

SILICON;

EID: 34547908556     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.633     Document Type: Article

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